CHEMICAL POLISHING OF SOLAR CELL SURFACES AND RESULTING STRUCTURES

Chemical polishing of solar cell surfaces and the resulting structures are described herein. In an example, a method of fabricating a solar cell includes texturizing both first side and second side surfaces of a silicon substrate with a first hydroxide-based etch process. The method also includes re...

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Bibliographic Details
Main Authors MONTESDEOCA SANTANA AMADA, BALU VENKATASUBRAMANI, HARRINGTON SCOTT
Format Patent
LanguageChinese
English
Published 16.07.2019
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Summary:Chemical polishing of solar cell surfaces and the resulting structures are described herein. In an example, a method of fabricating a solar cell includes texturizing both first side and second side surfaces of a silicon substrate with a first hydroxide-based etch process. The method also includes reducing a surface roughness factor of the texturized second side surface of the silicon substrate with a second hydroxide-based etch process. The method also includes, subsequent to reducing the surface roughness factor of the texturized second side surface of the silicon substrate, forming emitter regions on the second side surface of the silicon substrate. 本发明涉及太阳能电池表面的化学抛光及所得的结构。在一个实例中,制造太阳能电池的方法包括利用第一基于氢氧化物的蚀刻工艺对硅基板的第一侧表面和第二侧表面均进行纹理化。所述方法还包括利用第二基于氢氧化物的蚀刻工艺减小所述硅基板的所述纹理化的第二侧表面的表面粗糙度因子。所述方法还包括在减小所述硅基板的所述纹理化的第二侧表面的所述表面粗糙度因子之后,在所述硅基板的所述第二侧表面上形成发射极区。
Bibliography:Application Number: CN201811638256