Nano-imprinting device capable of preparing complex microstructure

• Main Authors: ZHEMING ZHANG, GONGCHENG ZHENG, JINGPENG LI, DIANZHENG WANG, JIN ZHANG, ZISU XU, BIN FU, JIEQIONG LIN, KAITUO FENG, XINYU CANG, DEEN DAI, ZHENGFA YI, QUN ZHANG, YAN GU, MINGMING LU
• Format: Patent
• Language: Chinese; English
• Published: 16.07.2019
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The invention discloses a nano-imprinting device capable of preparing a complex microstructure. A method comprises the steps of firstly, unwinding a substrate by an unwinding roller; applying photoresist to the substrate by a glue application roller; conveying the substrate to the lower part of the imprinting device; heating the photoresist to a vitrification temperature by a heating roller; carrying out imprinting by an imprinting roller I, and then carrying out curing; removing a residual layer through an etching device; returning the substrate to the lower part of the imprinting device again, and then carrying out heating; rotating an imprinting roller II to the upper part of the photoresist subjected to the first-time imprinting by a rotating disc; carrying out imprinting by the imprinting roller II; and after imprinting by the imprinting roller II, repeating the steps until an imprinting roller III finishes imprinting, and winding the obtained substrate with the complex microstructure through a winding r