Holographic exposure system and method for making grating

The present disclosure relates to a holographic exposure system and method for making a grating. The system includes a first wave plate and a second wave plate that change a polarization direction ofa beam. A polarization beam splitter that splits the beam of a light source into a first beam and a s...

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Bibliographic Details
Main Authors WU GUANHAO, ZENG LIJIANG, LI WUNAN
Format Patent
LanguageChinese
English
Published 12.07.2019
Subjects
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
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Summary:The present disclosure relates to a holographic exposure system and method for making a grating. The system includes a first wave plate and a second wave plate that change a polarization direction ofa beam. A polarization beam splitter that splits the beam of a light source into a first beam and a second beam, and the two beams are respectively transmitted to a first pinhole filter and a reflector. The second beam is aligned with the polarization direction of the first beam by using the second wave plate. The reflector reflects the second beam to the second pinhole filter. The first pinhole filter and the second pinhole filter respectively filter and expand the first beam and the second beam, and then simultaneously transmit the first beam and the second beam to one side of a collimationmirror. The collimation mirror is located at a convergence portion of central optical axes of the two pinhole filters, collimates the first beam and the second beam and sends them to the other side toform an interference regio
Bibliography:Application Number: CN201910424435