Vapor deposition furnace and method for producing silicon monooxide

The invention discloses a vapor deposition furnace and a method for producing silicon monooxide. The vapor deposition furnace comprises a furnace body, and also a heating chamber, a deposition chamberand a receiving mechanism that are disposed in the furnace body, wherein the heating chamber is conf...

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Bibliographic Details
Main Authors ZHU WENBO, XUE MINGHUA, YIN BO, WANG WEN, FAN XIECHENG, XIA GAOQIANG
Format Patent
LanguageChinese
English
Published 02.07.2019
Subjects
BLASTING
CHEMISTRY
COMPOUNDS THEREOF
DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS,IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KINDOF FURNACE
FURNACES
HEATING
INORGANIC CHEMISTRY
KILNS
LIGHTING
MECHANICAL ENGINEERING
METALLURGY
NON-METALLIC ELEMENTS
OVENS
RETORTS
WEAPONS
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Summary:The invention discloses a vapor deposition furnace and a method for producing silicon monooxide. The vapor deposition furnace comprises a furnace body, and also a heating chamber, a deposition chamberand a receiving mechanism that are disposed in the furnace body, wherein the heating chamber is configured to heat raw materials so that the raw materials react to generate a product, and to gasify the product; the deposition chamber is hermetically connected to the heating chamber and communicated with the heating chamber; a deposition mechanism for depositing the product is disposed in the deposition chamber; the deposition mechanism is a rotatable impeller mechanism, and can toss out the deposition product deposited thereon by rotating; a deposition chamber opening is formed in the deposition chamber, and the atmosphere in the deposition chamber is conditioned through the deposition chamber opening; and the receiving mechanism is configured to receive the deposition product which is tossed out from the deposit
Bibliography:Application Number: CN201711420170