VERTICAL HEAT TREATMENT APPARATUS

• Main Authors: ITABASHI KEN, KO KYUNG SEOK, OGAWA SATORU, SHIMA HIROMI, KIKAMA EIJI, HISHIYA SHINGO, JO TOSIHIKO, SUZUKI KEISUKE
• Format: Patent
• Language: Chinese; English
• Published: 28.06.2019
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

The present invention provides a vertical heat treatment apparatus capable of reducing variations in the flow of gas in a substrate processing region and reducing the amount of decomposition productsadhering to the inner wall of a gas nozzle. There is provided a vertical heat treatment apparatus for forming a film by supplying a precursor gas to a plurality of substrates that are held in a substantially horizontal posture on a substrate holder with a predetermined interval in a vertical direction. The apparatus includes a processing container including an inner tube accommodating the substrate holder and an outer tube that is disposed outside the inner tube; and a gas nozzle that extends vertically along an inner peripheral surface of the inner tube and has a distal end that penetrates from an inside of the inner tube to an outside of the inner tube. A first gas hole for supplying the precursor gas to the inside of the inner tube and a second gas hole for supplying the precursor gas to the outside of the inne