METHOD FOR FORMING PHOTOMASK

• Main Authors: YANG MIN-AN, CHEN MINFENG, WEI SHAOI, CHANG SHIH-MING
• Format: Patent
• Language: Chinese; English
• Published: 04.06.2019
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The embodiment of the invention provides a method for forming a photomask. The method includes the steps: forming a light blocking layer over a transparent substrate. The method includes forming a mask layer over the light blocking layer. The mask layer covers a first portion of the light blocking layer, and the first portion is over a second portion of the transparent substrate. The method includes removing the light blocking layer, which is not covered by the mask layer. The method includes removing the mask layer. The first portion of the light blocking layer is removed during removing themask layer. The method includes removing the second portion of the transparent substrate to form a first recess in the transparent substrate. The method includes forming a first light blocking structure in the first recess. 本发明实施例提供形成掩模的方法。此方法包括在透明基板之上形成遮光层。此方法包括在遮光层之上形成遮罩层。遮罩层覆盖遮光层的第一部分，且第一部分位于透明基板的第二部分之上。此方法包括去除没有被遮罩层覆盖的遮光层。此方法包括去除遮罩层。在去除遮罩层期间，去除遮光层的第一部分。此方法包括去除透明基板的第二部分，以在透明基板中形成第一凹槽。此方法包括在第一凹槽中形成第一遮光结构。