Glue nozzle cleaning system using electric control back suction valve and cleaning method thereof

The invention belongs to the field of liquid treatment for a glue homogenization process of a wafer in a semiconductor industry, in particular to a glue nozzle cleaning system by using an electric control back suction valve and a cleaning method thereof. The cleaning system involves a glue head, a g...

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Bibliographic Details
Main Authors GAO XIAOXU, GENG KETAO
Format Patent
LanguageChinese
English
Published 28.05.2019
Subjects
APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL
APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
PERFORMING OPERATIONS
SPRAYING OR ATOMISING IN GENERAL
TRANSPORTING
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Abstract The invention belongs to the field of liquid treatment for a glue homogenization process of a wafer in a semiconductor industry, in particular to a glue nozzle cleaning system by using an electric control back suction valve and a cleaning method thereof. The cleaning system involves a glue head, a glue nozzle, a glue nozzle cleaning tank, a glue nozzle cleaning pipe, an on-off valve, a glue path heat preservation pipe, the electric control back suction valve and an electric control back suction valve controller; and the glue nozzle is driven by a lifting component to enter the glue nozzle cleaning tank, under action by the electric control back suction valve controller and through controlling the on-off valve, the electric control back suction valve can backwards suck glue nozzle cleaningliquid in a high-precision mode in a cleaning chamber of the glue nozzle cleaning tank, so that the purpose of cleaning the glue nozzle is achieved. According to the system and the method thereof, residual photoresist on the
AbstractList The invention belongs to the field of liquid treatment for a glue homogenization process of a wafer in a semiconductor industry, in particular to a glue nozzle cleaning system by using an electric control back suction valve and a cleaning method thereof. The cleaning system involves a glue head, a glue nozzle, a glue nozzle cleaning tank, a glue nozzle cleaning pipe, an on-off valve, a glue path heat preservation pipe, the electric control back suction valve and an electric control back suction valve controller; and the glue nozzle is driven by a lifting component to enter the glue nozzle cleaning tank, under action by the electric control back suction valve controller and through controlling the on-off valve, the electric control back suction valve can backwards suck glue nozzle cleaningliquid in a high-precision mode in a cleaning chamber of the glue nozzle cleaning tank, so that the purpose of cleaning the glue nozzle is achieved. According to the system and the method thereof, residual photoresist on the
Author GAO XIAOXU
GENG KETAO
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Chemistry
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DocumentTitleAlternate 一种使用电控回吸阀的胶嘴清洗系统及其清洗方法
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Snippet The invention belongs to the field of liquid treatment for a glue homogenization process of a wafer in a semiconductor industry, in particular to a glue nozzle...
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SubjectTerms APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL
APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
PERFORMING OPERATIONS
SPRAYING OR ATOMISING IN GENERAL
TRANSPORTING
Title Glue nozzle cleaning system using electric control back suction valve and cleaning method thereof
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