LITHOGRAPHIC APPARATUS

• Main Authors: LIMPENS PATRICK WILLEM PAUL, DE VRIES GOSSE CHARLES, KOEVOETS ADRIANUS HENDRIK, DE HOOGH JOOST, VAN DER MEULEN FRITS, DE WIT PAUL CORNE HENRI, HOOGENDAM CHRISTIAAN ALEXANDER, VAN DER MEULEN STAN HENRICUS, LEROUX ALAIN LOUIS CLAUDE, LAFARRE RAYMOND WILHELMUS LOUIS, VALENTIN CHRISTIAAN LOUIS, COX HENDRIKUS HERMAN MARIE, VAN DER SANDEN JACOBUS CORNELIS GERARDUS, OVERKAMP JIM VINCENT, HEMSCHOOTE DRIES VAAST PAUL, VAN DER SCHOOT HARMEN KLAAS, DERKS SANDER CATHARINA REINIER, GIJZEN RONALD CORNELIS GERARDUS, VLES DAVID FERDINAND, VAN BERKEL KOOS, CUIJPERS MARTINUS AGNES WILLEM, ARLEMARK ERIK JOHAN, WESTERHUIS EVERT AUKE RINZE
• Format: Patent
• Language: Chinese; English
• Published: 24.05.2019
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate. 一种光刻设备，包括被配置为投射图案化辐射束以在被保持在衬底台上的衬底上形成曝光区域的投影系统，光刻设备进一步包括用于冷却衬底的冷却设备，其中冷却设备包括位于衬底台上方并且邻近于曝光区域的冷却元件，冷却元件被配置为从衬底去除热量。