METHOD AND APPARATUS FOR CLEANING A GLASS SUBSTRATE

An apparatus and method for cleaning a glass substrate is disclosed, the apparatus including a shroud assembly arranged along a conveyance path of a glass substrate such that an opening of shroud portion of the shroud assembly is adjacent the glass substrate. A nozzle assembly contained within a hol...

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Bibliographic Details
Main Authors FU HSUEH HUNG, ZHOU NAIYUE, HOU JUN YUAN, MU XIAOFENG, RYSZYTIWSKYJ WILLIAM PAUL, HSU TZU HEN
Format Patent
LanguageChinese
English
Published 16.04.2019
Subjects
CLEANING
CLEANING IN GENERAL
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
TRANSPORTING
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Summary:An apparatus and method for cleaning a glass substrate is disclosed, the apparatus including a shroud assembly arranged along a conveyance path of a glass substrate such that an opening of shroud portion of the shroud assembly is adjacent the glass substrate. A nozzle assembly contained within a hollow interior space of the shroud assembly rotates while directing a jet of gas at the glass substrate, dislodging particulate. A vacuum is applied to a second interior hollow space defined by a skirt portion extending around the shroud, thereby removing the dislodged particulate. A second vacuum isapplied to a back portion of the shroud to remove particulate accumulated in the shroud. The apparatus may further include a gas knife arranged adjacent the shroud assembly and a vacuum channel arranged below the shroud assembly. 公开了种用于清洁玻璃基材的设备和方法，所述设备包括护罩组件，其沿着玻璃基材的传送路径布置以使护罩组件的护罩部分的开口毗邻玻璃基材。当将气体射流引导到玻璃基材时，包含在护罩组件的中空内部空间中的喷嘴组件旋转，从而移除微粒。第二中空内部空间由围绕护罩延伸的裙部限定，向该第二中空内部空间施加真空，从而去除所移除的微粒。向护罩的后部施加第二真空以移除积聚在护罩中的微粒。所述设备还可以包括布置在护
Bibliography:Application Number: CN201780052673