Lithographic plate based on pattern compensation and making method thereof

The invention discloses a lithographic plate based on pattern compensation and a making method thereof. The making method includes the following steps: S1, forming a first layout on a lithographic plate; S2, using the lithographic plate with the first layout to carry out a lithographic process to ob...

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Bibliographic Details
Main Author HUANG YUYANG
Format Patent
LanguageChinese
English
Published 16.04.2019
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The invention discloses a lithographic plate based on pattern compensation and a making method thereof. The making method includes the following steps: S1, forming a first layout on a lithographic plate; S2, using the lithographic plate with the first layout to carry out a lithographic process to obtain an actual pattern after lithography; S3, obtaining the pattern difference based on transverse etching according to the first layout and the actual pattern after lithography; S4, making pattern compensation for the first layout according to the pattern difference to obtain a second layout; and S5, forming the second layout on the lithographic plate. The original layout is compensated and corrected according to the pattern difference between the original layout and the actual pattern, the pattern size of transverse etching in the etching process is compensated into the lithographic plate layout, and an ideal target pattern can be formed by etching. The lithographic plate is applicable tothe process flow of vario
Bibliography:Application Number: CN201811571815