Photocuring antireflection layer and preparation method and application thereof as well as heat absorption thin film and preparation method and application thereof

• Main Authors: XIA ZHENGYUAN, XU DAOJIN, JIAO QINGTAI, HU ZHANGSHUN
• Format: Patent
• Language: Chinese; English
• Published: 12.03.2019
• Subjects: ADHESIVES; BLASTING; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; CORRECTING FLUIDS; DYES; FILLING PASTES; HEATING; INKS; LIGHTING; MECHANICAL ENGINEERING; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; POLISHES; RANGES; SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS; USE OF MATERIALS THEREFOR; VENTILATING; WEAPONS; WOODSTAINS

The invention provides a photocuring antireflection layer and a preparation method and application thereof as well as a heat absorption thin film and a preparation method and application thereof, andrelates to the technical field of solar heat collector. The photocuring antireflection layer provided by the invention is mainly prepared from silicon dioxide sol and photocuring resin, wherein the silicon dioxide sol can form a component reducing light reflection, photocuring resin achieves preparation of antireflection layer at the room temperature, and the problem that discoloring and tenderingoccur on a selective heat absorption layer in the preparation process of the antireflection layer is solved. The preparation method of the photocuring antireflection layer comprises the steps that the silicon dioxide sol and the photocuring resin are mixed, sprayed and cured, and the photocuring antireflection layer is obtained. The energy consumption and cost in the preparation process are lowered, the obtained photocuri