Substrate processing apparatus

Provided is a substrate-processing device capable of preventing a top lid from sagging downward by the own weight of the substrate-processing device and/or a vacuum suction force generated by a vacuumpump and/or thermal shock at high temperature process, in a chamber including a plurality of reactor...

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Bibliographic Details
Main Authors KIM DAE YOUN, KIM HIE CHUL, LEE JU IL
Format Patent
LanguageChinese
English
Published 12.02.2019
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:Provided is a substrate-processing device capable of preventing a top lid from sagging downward by the own weight of the substrate-processing device and/or a vacuum suction force generated by a vacuumpump and/or thermal shock at high temperature process, in a chamber including a plurality of reactors. Also, provided is a rotating shaft for transferring a substrate between the plurality of reactors. 本发明提供种衬底处理装置，所述衬底处理装置能够防止顶盖通过衬底处理装置的自身重量和/或由真空泵产生的真空吸引力和/或高温过程下的热冲击而在包含多个反应器的腔室中向下方下垂。并且，提供种用于在多个反应器之间传递衬底的旋转轴。
Bibliography:Application Number: CN201810835270