Substrate for ion trap, ion trap and processing method of hyperboloid quadrupole rod

The present invention discloses a substrate for an ion trap, an ion trap and a processing method of a hyperboloid quadrupole rod. The substrate for an ion trap is used for a hyperboloid linear ion trap, the substrate comprises a substrate body and a through hole arranged on the substrate body, and t...

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Bibliographic Details
Main Authors LIU XINGBAO, LEI TIANCAI, PAN XIAOBIN, ZHONG LI, JIANG JIADONG, WU DINGZHU
Format Patent
LanguageChinese
English
Published 01.02.2019
Subjects
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Summary:The present invention discloses a substrate for an ion trap, an ion trap and a processing method of a hyperboloid quadrupole rod. The substrate for an ion trap is used for a hyperboloid linear ion trap, the substrate comprises a substrate body and a through hole arranged on the substrate body, and the through hole is a circular hole; the substrate further comprises groove bodies arranged on the hole wall of the through hole, there are four groove bodies, and the groove bodies are bar-type grooves with length directions along the axial direction of the through hole, and the four groove bodies are circularly uniformly distributed on the hole wall; and each groove body penetrates the two ends of the substrate body. The hyperboloid quadrupole rod comprises the substrate, and the processing method is the processing method of the hyperboloid quadrupole rod. The structure design and the processing method mentioned above can allow the single processing of the four hyperboloid quadrupole rods to become integrated proc
Bibliography:Application Number: CN201811239470