Method for forming a layer and Apparatus for forming a layer

• Main Authors: PARK GU-SEONG, PARK BAE-WAN
• Format: Patent
• Language: Chinese; English
• Published: 01.02.2019
• Subjects: APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; ATOMISING APPARATUS; ELECTRICITY; NOZZLES; PERFORMING OPERATIONS; SPRAYING APPARATUS; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

A thin film forming apparatus, capable of supplying a chemical agent to a substrate by means of a nozzle, wherein the driving component is used for driving the base plate to rotate; a pressure adjusting component can be used to enable the nozzle to keep a substantially-positive pressure state during the period when the chemical agent is supplied to the substrate. The pressure adjusting part can maintain the pressure of the nozzle to be substantially 0 when the chemical agent is supplied to the end part of the substrate, and when the nozzle is located on a predetermined portion of the substrateafter the chemical agent is supplied to the end portion of the substrate, the pressure of the nozzle can be kept in a substantially negative pressure state. 种薄膜形成装置，能够通过喷嘴向基板上供应化学制剂，能够利用驱动部件移动所述基板或/及所述喷嘴，能够利用压力调节部件在向所述基板上供应所述化学制剂期间使所述喷嘴保持实质上正压的状态。所述压力调节部在向所述基板的端部上供应所述化学制剂的过程结束时可以使所述喷嘴的压力保持实质上为"0"，向所述基板的端部上供应所述化学制剂后所述喷嘴位于所述基板的预定部分上时，能够使所述喷嘴的压力保持实质上负压的状态。