Plasma fluorescent lifetime measuring device and method
The invention relates to a plasma fluorescent lifetime measuring device and method and a data processing device. The plasma fluorescent lifetime measuring device comprises a pulse laser used for periodically emitting pulse laser to a plasma flow field; and an ICCD imaging device used for shooting th...
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Main Authors | , , , , , , |
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Format | Patent |
Language | Chinese English |
Published |
22.01.2019
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Subjects | |
Online Access | Get full text |
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Summary: | The invention relates to a plasma fluorescent lifetime measuring device and method and a data processing device. The plasma fluorescent lifetime measuring device comprises a pulse laser used for periodically emitting pulse laser to a plasma flow field; and an ICCD imaging device used for shooting the area of the plasma flow field subject to the effect of pulse laser; the ICCD imaging device shootsone frame in each period of pulse laser and the start time of each frame in the corresponding period of pulse laser delays a preset value in sequence. According to the invention, a fluorescent imagein a two-dimensional space of the plasma flow field is collected by ICCD; the fluorescent accumulative intensity value of each pixel can be extracted; and fluorescent accumulative intensity values corresponding to different start times shot in different periods of pulse laser are fitted, thus obtaining the plasma fluorescent lifetime and measuring two-dimensional distribution of the plasma fluorescent lifetime.
本发明涉及种等离子体荧 |
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Bibliography: | Application Number: CN201811244128 |