Plasma fluorescent lifetime measuring device and method

The invention relates to a plasma fluorescent lifetime measuring device and method and a data processing device. The plasma fluorescent lifetime measuring device comprises a pulse laser used for periodically emitting pulse laser to a plasma flow field; and an ICCD imaging device used for shooting th...

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Bibliographic Details
Main Authors LIU LIPING, LUO JIE, MA HAOJUN, ZHANG JUN, WANG GUOLIN, ZHAO CHANGHAO, XIAO XUEREN
Format Patent
LanguageChinese
English
Published 22.01.2019
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Summary:The invention relates to a plasma fluorescent lifetime measuring device and method and a data processing device. The plasma fluorescent lifetime measuring device comprises a pulse laser used for periodically emitting pulse laser to a plasma flow field; and an ICCD imaging device used for shooting the area of the plasma flow field subject to the effect of pulse laser; the ICCD imaging device shootsone frame in each period of pulse laser and the start time of each frame in the corresponding period of pulse laser delays a preset value in sequence. According to the invention, a fluorescent imagein a two-dimensional space of the plasma flow field is collected by ICCD; the fluorescent accumulative intensity value of each pixel can be extracted; and fluorescent accumulative intensity values corresponding to different start times shot in different periods of pulse laser are fitted, thus obtaining the plasma fluorescent lifetime and measuring two-dimensional distribution of the plasma fluorescent lifetime. 本发明涉及种等离子体荧
Bibliography:Application Number: CN201811244128