PLASMA SOURCE, EXCITATION SYSTEM AND METHOD FOR OPERATING EXCITATION SYSTEM

The disclosure provides a plasma source, an excitation system for excitation of a plasma, and a method of operating an excitation measurement system. In one embodiment, the plasma source includes: (1)a coaxial radio frequency (RF) resonator including a first end, a second end, an inner electrode and...

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Bibliographic Details
Main Author MELONI MARK A
Format Patent
LanguageChinese
English
Published 18.01.2019
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Summary:The disclosure provides a plasma source, an excitation system for excitation of a plasma, and a method of operating an excitation measurement system. In one embodiment, the plasma source includes: (1)a coaxial radio frequency (RF) resonator including a first end, a second end, an inner electrode and an outer electrode, (2) a radio frequency interface electrically coupled to the inner and outer electrode and configured to provide an RF signal to the coaxial RF resonator, (3) a flange positioned at the first end of the resonator and defining a plasma cavity, and (4) a window positioned betweenthe first end of the resonator and the flange, and forming one side of the plasma cavity, whereby the coaxial RF resonator is isolated from the plasma. 本公开提供等离子体源、用于激发等离子体的激发系统以及操作激发测量系统的方法。在个实施例中,所述等离子体源包含:(1)同轴射频RF谐振器,其包含第末端、第二末端、内部电极和外部电极,(2)射频接口,其电耦合到所述内部电极和所述外部电极且经配置以将RF信号提供到所述同轴RF谐振器,(3)凸缘,其定位于所述谐振器的所述第末端处且限定等离子体腔体,以及(4)窗口,其定位于所述谐振器的所述第末端与所述凸缘之间且形成所述等离子体腔体的侧,由此所述同轴RF谐振器与所述等离子体隔离。
Bibliography:Application Number: CN201810746909