SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME
This semiconductor device is provided with: first and second inspection mark regions (51a, 51b) having same patterns, each of which includes a plurality of superposition inspection marks (61a, 61b); afirst element region (52) having a part that overlaps the first inspection mark region (51a); and a...
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Main Authors | , |
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Format | Patent |
Language | Chinese English |
Published |
21.12.2018
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Subjects | |
Online Access | Get full text |
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