Preparation method of thin film encapsulation layer and OLED display device

• Main Authors: GUO TIANFU, XU XIANGLUN, XIA CUNJUN
• Format: Patent
• Language: Chinese; English
• Published: 18.12.2018
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

The invention provides a preparation method of a thin film encapsulation layer and an OLED display device. The preparation method of the thin film encapsulation layer comprises the following steps: providing a substrate provided with an OLED light emitting device; forming a barrier layer around the OLED light emitting device on the substrate, the barrier layer being made of an organic material having a hydrophobic property; forming a first inorganic encapsulation layer on the substrate, the first inorganic encapsulation layer covering the OLED light emitting device; removing the barrier layer;forming an organic encapsulation layer on the surface of the first inorganic encapsulation layer; and forming a second inorganic encapsulation layer on the surface of the organic encapsulation layer.The beneficial effect is that the barrier layer arranged in the invention can enable the inorganic film layer to be deposited in a specific area, thus avoiding the use of the photomask manufacturingprocess and saving the cost