Semiconductor processing chamber for improved precursor flow

• Main Authors: TIEN FAK TAN, EDWIN C. SUAREZ, PHONG PHAM, SOONAM PARK, SOONWOOK JUNG, DMITRY LUBOMIRSKY, RAYMOND W. LU
• Format: Patent
• Language: Chinese; English
• Published: 07.12.2018
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

A semiconductor processing chamber for an improved precursor flow is disclosed. Exemplary semiconductor processing systems may include a processing chamber, and may include a remote plasma unit coupled with the processing chamber. Exemplary systems may also include an adapter coupled with the remote plasma unit. The adapter may include a first end and a second end opposite the first end. The adapter may define an opening to a central channel at the first end, and the central channel may be characterized by a first cross-sectional surface area. The adapter may define an exit from a second channel at the second end, and the adapter may define a transition between the central channel and the second channel within the adapter between the first end and the second end. The adapter may define a third channel between the transition and the second end of the adapter, and the third channel may be fluidly isolated from the central channel and the second channel. 公开了用于经改善的前驱物流的半导体处理腔室。示例性半导体处理系统可以包括处理腔室，并且可以包括与处理腔室耦接的远程等