Mask, display substrate, manufacturing method thereof, and display device

• Main Authors: CHEN DU, DU HONGWEI, LI GUIXUAN
• Format: Patent
• Language: Chinese; English
• Published: 30.11.2018
• Subjects: DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; PHYSICS; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

The invention provides a mask, a display substrate, a manufacturing method thereof, and a display device. The mask is used for manufacturing a photo spacer on the display substrate and comprises a light shield layer. The light shield layer comprises light shield patterns and a plurality of opening patterns defined by the light shield patterns. In the direction perpendicular to a plane of the mask,sections of the opening patterns are each in an inverted-trapezoid shape, and the inverted trapezoid is not a right-angle trapezoid. When the mask is adopted to manufacture the spacer, parallel half-angle ultraviolet rays on the two sides of the opening patterns can be shielded and absorbed, thus the difference value of the top dimension and the bottom dimension of the manufactured spacer is decreased, the top dimension of the manufactured spacer can be increased under the situation that the bottom dimension of the spacer is not changed, supporting force of the manufactured spacer is increased, and thus the Mura defe