PHOTOSENSITIVE SILOXANE COMPOSITION

• Main Authors: TANIGUCHI KATSUTO, TAKAHASHI MEGUMI, KUZAWA MASAHIRO, YOKOYAMA DAISHI, YOSHIDA NAOFUMI
• Format: Patent
• Language: Chinese; English
• Published: 23.11.2018
• Subjects: ADHESIVES; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; CORRECTING FLUIDS; DYES; FILLING PASTES; INKS; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC MACROMOLECULAR COMPOUNDS; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; POLISHES; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF MATERIALS THEREFOR; WOODSTAINS

To provide a composition capable of forming a cured film having low permittivity and excellence in chemical resistance, in heat resistance and in resolution; and further to provide a production process employing the composition. The present invention provides a composition comprising : an alkali-soluble resin, namely, a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl- containing polymerization unit; a polysiloxane; a diazonaphthoquinone derivative; a compound generating acid or base when exposed to heat or light; and a solvent. [目的]提供种组合物，其可形成耐化学品性、耐热性以及分辨性优异的低介电性的固化膜。还提供种使用所述组合物的制造方法。[手段]本发明提供种组合物，其包含：碱可溶性树脂、聚硅氧烷、重氮基萘醌衍生物、暴露于热或者光时产生酸或者碱的化合物、以及溶剂，所述碱可溶性树脂是包含有包含羧基的聚合单元与包含烷氧基甲硅烷基的聚合单元的聚合物。