Solution impurity removal method and solution impurity removal system

The invention discloses a solution impurity removal method and a solution impurity removal system for carrying out the method. The solution impurity removal method mainly comprises the following steps: (S1) storing a to-be-treated solution by virtue of a waste liquid storage container; (S2) extracti...

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Bibliographic Details
Main Author LU XUPING
Format Patent
LanguageChinese
English
Published 13.11.2018
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Summary:The invention discloses a solution impurity removal method and a solution impurity removal system for carrying out the method. The solution impurity removal method mainly comprises the following steps: (S1) storing a to-be-treated solution by virtue of a waste liquid storage container; (S2) extracting a preset volume of the to-be-treated solution from the waste liquid storage container, and introducing the to-be-treated solution into a batch reaction container for reaction, so as to obtain the treated solution, wherein the impurity content of the treated solution is not higher than a preset value; and (S3) introducing the treated solution in the batch reaction container into a new liquid storage container for storage, and returning to the step (S2). Therefore, the solution impurity removalmethod and the solution impurity removal system can be utilized for removing hydrogen peroxide in a sulfuric acid solution, and the aim of efficient treatment is achieved in a ''multi-batch manner''. 本发明公开了种溶液除杂方法和种用于进行该方法溶液
Bibliography:Application Number: CN201811122647