SYSTEM DESIGN FOR IN-LINE PARTICLE AND CONTAMINATION METROLOGY FOR SHOWERHEAD AND ELECTRODE PARTS

• Main Authors: MARY ANNE PLANO, BHASKAR SOMPALLI, IAN SCOT LATCHFORD
• Format: Patent
• Language: Chinese; English
• Published: 06.11.2018
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

The invention relates to system design for an in-line particle and contamination metrology for a showerhead and electrode parts. A method for testing cleanliness of a component of a substrate processing chamber includes loading the component into a vacuum chamber, arranging a test substrate within the vacuum chamber, with the component and the test substrate loaded within the vacuum chamber, providing a purge gas to the vacuum chamber, determining at least one of an amount of particles accumulated on the test substrate and an amount of metal contamination accumulated on the test substrate caused by providing the purge gas to the vacuum chamber, and estimating the cleanliness of the component based on the at least one of the determined amount of particles accumulated on the test substrate and the determined amount of metal contamination accumulated on the test substrate. 本发明涉及用于喷头和电极组件的颗粒和污染在线计量的系统设计。种用于测试衬底处理室的组件的清洁度的方法包括：将所述组件装载到真空室中；将测试衬底布置在所述真空室内；在所述组件和所述测试衬底装载在所述真空室内的情况下，向所述真空室提供清扫气体；确定通过向所述真空室提供所述清扫气体而导致