SILICON WAFER CLEANER AND METHOD FOR CLEANING SILICON WAFER

• Main Authors: CHUN-HO CHEN, JIAN-YU LIN, IING LI, SUNG-LIN HSU
• Format: Patent
• Language: Chinese; English
• Published: 09.10.2018
• Subjects: ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES; BASIC ELECTRIC ELEMENTS; CANDLES; CHEMISTRY; DETERGENT COMPOSITIONS; DETERGENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FATTY ACIDS THEREFROM; METALLURGY; RECOVERY OF GLYCEROL; RESIN SOAPS; SEMICONDUCTOR DEVICES; SOAP OR SOAP-MAKING; USE OF SINGLE SUBSTANCES AS DETERGENTS

A cleaner for silicon wafer and a method for cleaning silicon wafer are provided. The cleaner for silicon wafer is essentially consisted of 1-3 wt % of citric acid, 2.5-5 wt % of sodium bicarbonate, limonene, potassium hydroxide and water. The cleaning efficiency may be improved by using the cleaner for silicon wafer to clean the silicon wafer. 本发明提出种硅晶圆洗剂与种清洗硅晶圆的方法。所述硅晶圆洗剂主要由1wt％～3wt％的柠檬酸、2.5wt％～5wt％的碳酸氢钠、柠檬烯、氢氧化钾以及水组成。使用所述硅晶圆洗剂清洗硅晶圆能提升清洁效率。