SILICON WAFER CLEANER AND METHOD FOR CLEANING SILICON WAFER
A cleaner for silicon wafer and a method for cleaning silicon wafer are provided. The cleaner for silicon wafer is essentially consisted of 1-3 wt % of citric acid, 2.5-5 wt % of sodium bicarbonate, limonene, potassium hydroxide and water. The cleaning efficiency may be improved by using the cleaner...
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Main Authors | , , , |
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Format | Patent |
Language | Chinese English |
Published |
09.10.2018
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Subjects | |
Online Access | Get full text |
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Summary: | A cleaner for silicon wafer and a method for cleaning silicon wafer are provided. The cleaner for silicon wafer is essentially consisted of 1-3 wt % of citric acid, 2.5-5 wt % of sodium bicarbonate, limonene, potassium hydroxide and water. The cleaning efficiency may be improved by using the cleaner for silicon wafer to clean the silicon wafer.
本发明提出种硅晶圆洗剂与种清洗硅晶圆的方法。所述硅晶圆洗剂主要由1wt%~3wt%的柠檬酸、2.5wt%~5wt%的碳酸氢钠、柠檬烯、氢氧化钾以及水组成。使用所述硅晶圆洗剂清洗硅晶圆能提升清洁效率。 |
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Bibliography: | Application Number: CN201711268777 |