SILICON WAFER CLEANER AND METHOD FOR CLEANING SILICON WAFER

A cleaner for silicon wafer and a method for cleaning silicon wafer are provided. The cleaner for silicon wafer is essentially consisted of 1-3 wt % of citric acid, 2.5-5 wt % of sodium bicarbonate, limonene, potassium hydroxide and water. The cleaning efficiency may be improved by using the cleaner...

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Bibliographic Details
Main Authors CHUN-HO CHEN, JIAN-YU LIN, IING LI, SUNG-LIN HSU
Format Patent
LanguageChinese
English
Published 09.10.2018
Subjects
ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES
BASIC ELECTRIC ELEMENTS
CANDLES
CHEMISTRY
DETERGENT COMPOSITIONS
DETERGENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FATTY ACIDS THEREFROM
METALLURGY
RECOVERY OF GLYCEROL
RESIN SOAPS
SEMICONDUCTOR DEVICES
SOAP OR SOAP-MAKING
USE OF SINGLE SUBSTANCES AS DETERGENTS
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Summary:A cleaner for silicon wafer and a method for cleaning silicon wafer are provided. The cleaner for silicon wafer is essentially consisted of 1-3 wt % of citric acid, 2.5-5 wt % of sodium bicarbonate, limonene, potassium hydroxide and water. The cleaning efficiency may be improved by using the cleaner for silicon wafer to clean the silicon wafer. 本发明提出种硅晶圆洗剂与种清洗硅晶圆的方法。所述硅晶圆洗剂主要由1wt％～3wt％的柠檬酸、2.5wt％～5wt％的碳酸氢钠、柠檬烯、氢氧化钾以及水组成。使用所述硅晶圆洗剂清洗硅晶圆能提升清洁效率。
Bibliography:Application Number: CN201711268777