PRESSURE CONTROL DEVICE AND PRESSURE CONTROL SYSTEM

Provided are a pressure control device and a pressure control system with which the pressure within a chamber can be maintained at a constant level quickly even if the volume of the chamber relative to a gas control flow rate is large or a pipe between a flow rate control valve and the chamber is lo...

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Bibliographic Details
Main Authors KANAI YOSHITOMO, NAKAMURA TAKESHI, NOZAWA TAKAHIRO
Format Patent
LanguageChinese
English
Published 28.09.2018
Subjects
CONTROLLING
PHYSICS
REGULATING
SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
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Summary:Provided are a pressure control device and a pressure control system with which the pressure within a chamber can be maintained at a constant level quickly even if the volume of the chamber relative to a gas control flow rate is large or a pipe between a flow rate control valve and the chamber is long. A pressure control device 1 comprises: a CPU 18 that subtracts, at a predetermined ratio, a flowrate signal from a set pressure signal when gas is being supplied into a chamber 3 in order to set the inside of the chamber 3 to a negative pressure; a comparator circuit 21 that compares a detectedpressure signal indicating the pressure within the chamber 3 that was detected by a pressure sensor 4 and the set pressure signal from which the flow rate signal has been subtracted; and a valve drive circuit 22 that controls a flow rate control valve 14 on the basis of the comparison results obtained by the comparator circuit 21. 本发明提供种压力控制装置及压力控制系统，即便是在相对于气体的控制流量，腔室的容积为大的情况下，或是在流量控制阀与腔室之间的配管较长的情况下，也能够在早期将腔室内的压力保持为恒定。压力控
Bibliography:Application Number: CN201780009508