Semiconductor device and operating method therefor
The invention discloses a semiconductor device and an operating method therefor, and relates to the technical field of semiconductors. The semiconductor device includes a substrate; an active region on the substrate, wherein the active region includes a first active region and a second active region...
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Main Authors | , |
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Format | Patent |
Language | Chinese English |
Published |
25.09.2018
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Subjects | |
Online Access | Get full text |
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Summary: | The invention discloses a semiconductor device and an operating method therefor, and relates to the technical field of semiconductors. The semiconductor device includes a substrate; an active region on the substrate, wherein the active region includes a first active region and a second active region arranged to be parallel to an extending direction of the first active region. The first active region includes a connecting portion, a first portion and a second portion, wherein the first and second portions are connected to both sides of the connecting portion. The connecting portion enables thefirst portion and the second portion to be connected together. The second active region includes a third portion and a fourth portion which are separated by a trench isolation portion, wherein the trench isolation portion is corresponding to the connecting portion. The semiconductor device also comprises a first dummy gate overlying the trench isolation portion and the connecting portion. The possibility of over-etching p |
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Bibliography: | Application Number: CN201710144098 |