Exposure equipment and exposure method

• Main Author: GUI YUCHANG
• Format: Patent
• Language: Chinese; English
• Published: 04.09.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The invention discloses exposure equipment, which comprises a carrying platform for carrying a substrate and an exposure device arranged above the carrying platform, wherein the carrying platform andthe exposure device are configured to relatively move in a first direction; the exposure device comprises a light source unit, an image sensor and a control unit; the control unit controls the image sensor to acquire image information of the surface contour of the substrate, and determines a focusing position of exposure work according to the image information; the control unit controls the lightsource unit to expose the substrate according to the determined focusing position; the image sensor has a certain length in a second direction vertical to the first direction, so as to enable the image sensor to form acquire the image information in a linear scanning manner in the second direction. The invention further discloses an exposure method for exposing the substrate by applying the above-mentioned exposure equipme