Low-irritation cleaning composition and preparation method thereof

The invention belongs to the technical field of cosmetics and provides a low-irritation cleaning composition and a preparation method thereof. The low-irritation cleaning composition comprises the following components in parts by weight: 5 to 15 parts of a wetting agent, 0.1 to 0.5 part of a foam st...

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Bibliographic Details
Main Author GONG DAOYONG
Format Patent
LanguageChinese
English
Published 10.08.2018
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Summary:The invention belongs to the technical field of cosmetics and provides a low-irritation cleaning composition and a preparation method thereof. The low-irritation cleaning composition comprises the following components in parts by weight: 5 to 15 parts of a wetting agent, 0.1 to 0.5 part of a foam stabilizer, 5 to 20 parts of a surfactant, 0.5 to 1.2 parts of a preservative, 0.5 to 2.0 parts of ananti-allergic agent, 0.01 to 0.1 part of a pH value regulator, 0.001 to 0.1 part of sodium hyaluronate, 0.001 to 0.1 part of a leontopodium alpinum extract, 0.001 to 0.1 part of a sunflower extract, 0to 0.03 part of an aromatic and 60 to 80 parts of water. The low-irritation cleaning composition has high transparency and relatively low counting rate (relatively high counting rate indicates that acleaning agent has more or larger aggregates capable of scattering more light); and besides, the prepared composition has higher skin cleanliness and does not has irritation to skin. 本发明属于化妆品技术领域,本发明提供了种低刺激清洁组合物及其制备方法,所述的低刺激清洁
Bibliography:Application Number: CN20181303303