Lithographic apparatus having an active base frame support

• Main Authors: BUKKEMS BJORN HUBERTUS MARIA, WIJCKMANS MAURICE WILLEM JOZEF ETIENNE, BUTLER HANS, DE HOON CORNELIUS ADRIANUS LAMBERTUS
• Format: Patent
• Language: Chinese; English
• Published: 03.08.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A lithographic apparatus comprises a base frame constructed to form a supporting structure of the lithographic apparatus, an active base frame support arranged between the base frame and a ground floor. The active base frame support is configured to support the base frame on the ground floor. The active base frame support comprises an actuator configured to exert a force in a horizontal directionbetween the base frame and the ground plane. The lithographic apparatus further comprises a control device configured to drive the actuator, a signal representative of a disturbance force on the baseframe being provided to the control device, the control device being configured to drive the actuator using the force sensor signal. 种光刻设备包括：构造成形成光刻设备的支撑结构的底架、布置在底架与地板之间的主动式底架支撑件。该主动式底架支撑件配置成在底板上支撑底架。该主动式底架支撑件包括致动器，该致动器配置成在底架与地面之间沿水平方向施加力。该光刻设备还包括控制装置，该控制装置配置成驱动致动器，表示该底架上的扰动力的信号被提供至控制装置，该控制装置配置成使用力传感器信号来驱动致动器。