Deformation correction method for processed microstructure in glass capillary

• Main Authors: DONG JIANFENG, NIU PENGKAI, GU YINWEI, TAO WEIDONG
• Format: Patent
• Language: Chinese; English
• Published: 24.07.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CALCULATING; CINEMATOGRAPHY; COMPUTING; COUNTING; ELECTRIC DIGITAL DATA PROCESSING; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The invention relates to a deformation correction method for a processed microstructure in glass capillary. The method comprises the following steps: (1) designing the shape and size of a to-be-prepared microstructure; (2) performing actual modeling and simulation on the designed microstructure by virtue of simulation software; (3) performing corresponding compensating variation, namely performingcorresponding compensating variation on lines in the to-be-prepared microstructure in a radial direction of the capillary according to a deformation tendency so as to obtain corrected line sizes, andsubstituting the line sizes into the to-be-prepared microstructure; (4) turning on a femtosecond laser, performing mode locking on the femtosecond laser, and guiding the laser into a micromachining worktable for focusing; (5) performing photoetching after focusing is completed. According to the method disclosed by the invention, the deformation phenomenon occurring in the field of the prepared microstructure in the capill