A method for manufacturing a membrane assembly

• Main Authors: VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN, JANSSEN PAUL, OOSTERHOFF SICCO
• Format: Patent
• Language: Chinese; English
• Published: 17.07.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; GAMMA RAY OR X-RAY MICROSCOPES; HOLOGRAPHY; IRRADIATION DEVICES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES; MATERIALS THEREFOR; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; NANOTECHNOLOGY; NUCLEAR ENGINEERING; NUCLEAR PHYSICS; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR; TRANSPORTING

A method for manufacturing a membrane assembly (80) for EUV lithography, the method comprising: providing a stack (40) comprising a membrane layer (45) between a supporting substrate (41) and an attachment substrate (51), wherein the supporting substrate comprises an inner region and a first border region; processing the stack, including selectively removing the inner region of the supporting substrate, to form a membrane assembly comprising: a membrane (45) formed from at least the membrane layer; and a support (81) holding the membrane, the support formed at least partially from the first border region of the supporting substrate. The attachment substrate can be bonded to the rest of the stack. 种用于制造用于EUV光刻的隔膜组件(80)的方法，所述方法包括：设置叠层(40)，所述叠层包括介于支撑衬底(41)与附接衬底(51)之间的隔膜层(45)，其中所述支撑衬底包括内部区和第边界区；加工所述叠层，包括选择性地移除所述支撑衬底的所述内部区，以形成隔膜组件，所述隔膜组件包括：隔膜(45)，所述隔膜由至少所述隔膜层形成；和支撑件(81)，所述支承件保持所述隔膜，所述支撑件至少部分地由所述支撑衬底的所述第边界区形成。所述附接衬底可被结合至所述叠层的其余部分。