Magnetron sputtering target cover

• Main Authors: ZHU YU, ZHANG PING, YUE WEIWEN, SHENTU JIANGMIN
• Format: Patent
• Language: Chinese; English
• Published: 03.07.2018
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention provides a magnetron sputtering target cove belonging to the technical field of substrate glass processing. The magnetron sputtering target cover comprises a cover surface and a side edge, wherein the side edge is arranged on the outer edge of the cover surface, a sealed graph is formed by encircling of the border line of the side edge and the cover surface, a sputtering window is arranged on the cover surface, the magnetron sputtering target cover also comprises a metal wire, two ends of the metal wire are fixed at the side edge, and the projection part, on the cover surface, ofthe metal wire is located at the sputtering window. The magnetron sputtering target cover can effectively promote the sedimentation and film forming effects of a target on the surface of a substrate. 本发明提供种磁控溅射靶罩，属于基板玻璃加工技术领域。该磁控溅射靶罩，包括罩面和侧边，侧边设置于罩面外边缘，侧边与罩面的交界线围合成个封闭的图形，罩面上设置有溅射窗口，还包括至少金属丝，金属丝两端固定于侧边，金属丝在罩面上的投影部分位于溅射窗口。该磁控溅射靶罩可有效提升靶材在基片表面沉积成膜的效果。