Optical calibration device and characterization system

• Main Authors: DAIGNAULT, RICK, LYNES, SEAN, CORLESS, JOHN D, WHELAN, MIKE, MELONI, MARK ANTHONY, KEUNY, ANDREW WEEKS
• Format: Patent
• Language: Chinese; English
• Published: 01.06.2018
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

The patent relates to an optical calibration device and a characterization system. The invention provides the optical calibration device for in-chamber calibration of optical signals associated with aprocessing chamber, a characterization system for plasma processing chambers, methods of characterizing plasma processing chambers, and a chamber characterizer. In one example, the optical calibration device includes: (1) an enclosure, (2) an optical source located within the enclosure and configured to provide a source light having a continuous spectrum, and (3) optical shaping elements locatedwithin the enclosure and configured to form the source light into a calibrating light that approximates a plasma emission during an operation within the processing chamber. 本申请案涉及种光学校准装置及表征系统。本发明提供种用于对与处理室相关联的光学信号进行室内校准的光学校准装置、种用于等离子体处理室的表征系统、表征等离子体处理室的方法及种室表征器。在个实例中，所述光学校准装置包含：(1)外壳，(2)光学源，其位于所述外壳内且经配置以提供具有连续光谱的源光，及(3)光学塑形元件，其位于所述外壳内且经配置以在所述处理室内的操作期间将所述源光成形为近似于等离子体发射的校准光。