CDSEM (Critical Dimension Scanning Electronic Microscope)-based feature recognition method and device

• Main Authors: BAI SONG, YUAN KEFANG
• Format: Patent
• Language: Chinese; English
• Published: 22.05.2018
• Subjects: CALCULATING; COMPUTING; COUNTING; HANDLING RECORD CARRIERS; PHYSICS; PRESENTATION OF DATA; RECOGNITION OF DATA; RECORD CARRIERS

The present invention provides a CDSEM (Critical Dimension Scanning Electronic Microscope)-based feature recognition method and device. The method includes the following steps that: the CDSEM identification information of a training substrate is acquired through a CDSEM, wherein the training substrate is provided with known features, wherein the CDSEM identification information contains a CDSEM image and a CDSEM feature curve corresponding to the CDSEM image; and a neural network is trained according to the CDSEM identification information of the training substrate and the known features, so that the trained neural network is suitable for feature recognition of a substrate to be recognized. With the CDSEM-based feature recognition method and device of the present invention adopted, the features of a semiconductor substrate can be identified more accurately based on the CDSEM. 本发明提供种基于CDSEM的特征识别方法及装置，所述方法包括：通过CDSEM获取训练衬底的CDSEM识别信息，所述训练衬底上设置有已知的特征，所述CDSEM识别信息包括CDSEM图像及其相应的CDSEM特征曲线；根据所述训练衬底的CDSEM识别信息以及所述已知的特征对神