SUBSTRATE WASHING DEVICE AND PROCESS
A washing device (1) for manual washing of a substrate (9), the washing device (1) comprising a receptacle (5) for containing an aqueous wash liquor (17) with a substrate (9) at least partially immersed therein; a filling and access aperture (11) defined by the upper peripheral edge portions (13) of...
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
11.05.2018
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Subjects | |
Online Access | Get full text |
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Summary: | A washing device (1) for manual washing of a substrate (9), the washing device (1) comprising a receptacle (5) for containing an aqueous wash liquor (17) with a substrate (9) at least partially immersed therein; a filling and access aperture (11) defined by the upper peripheral edge portions (13) of the washing receptacle (5); and at least one upper portion (7) of the washing device (1) which is transparent or translucent.
种用于手动洗涤基材(9)的洗涤装置(1),所述洗涤装置(1)包括用于容纳水性洗液(17)的容器(5),基材(9)至少部分地浸入所述水性洗液(17)中;由所述洗涤容器(5)的上周缘部分(13)限定的填充和进入孔(11);和所述洗涤装置(1)的至少个上部(7),其是透明或半透明的。 |
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Bibliography: | Application Number: CN2016854183 |