Mask plate and manufacturing method thereof

• Main Authors: ZHOU YANGCHUAN, LI JIANHUA, SU JUNHAI, WU JUNXIONG, WANG HAORUI, KE XIANJUN
• Format: Patent
• Language: Chinese; English
• Published: 04.05.2018
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention relates to a mask plate and a manufacturing method thereof. The method comprises the steps of preparing a substrate base plate with a pixel definition layer, wherein the pixel definitionlayer comprise a plurality of pixel patterns; detecting the position of each pixel pattern of the pi...