Mask plate and manufacturing method thereof

• Main Authors: ZHOU YANGCHUAN, LI JIANHUA, SU JUNHAI, WU JUNXIONG, WANG HAORUI, KE XIANJUN
• Format: Patent
• Language: Chinese; English
• Published: 04.05.2018
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention relates to a mask plate and a manufacturing method thereof. The method comprises the steps of preparing a substrate base plate with a pixel definition layer, wherein the pixel definitionlayer comprise a plurality of pixel patterns; detecting the position of each pixel pattern of the pixel definition layer of the substrate base plate to obtain and record a first coordinate value of each pixel pattern; according to the first coordinate value, adjusting the opening position of the pattern to make the a second coordinate value matched with the first coordinate value. By directly detecting the position of the pixel pattern of the substrate base plate, the coordinate value of the pixel pattern of the substrate base plate is obtained, according to the coordinate value of the pixelpattern, the opening position of the pattern of the substrate base plate is adjusted, so that the error between the mask plate and the substrate base plate, therefore the precision of the mask plate is higher, and the evaporat