Adjustable plasma photonic crystal frequency-selecting filter
The invention relates to an adjustable plasma photonic crystal frequency-selecting filter. The filter comprises a support box and a plasma generation device arranged in the support box. A first interface and a second interface are arranged at the top and bottom of the support box respectively. The i...
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Main Authors | , , , , |
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Format | Patent |
Language | Chinese English |
Published |
27.04.2018
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Subjects | |
Online Access | Get full text |
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Summary: | The invention relates to an adjustable plasma photonic crystal frequency-selecting filter. The filter comprises a support box and a plasma generation device arranged in the support box. A first interface and a second interface are arranged at the top and bottom of the support box respectively. The inside of the first interface and the inside of the second interface are both connected with the plasma generation device. One of the outside of the first interface and the outside of the second interface is connected with a drive power supply, and the other is connected with the ground. A rectangular waveguide is arranged on the left side of the support box. A photoelectric signal conversion device is arranged on the right side of the support box. The photoelectric signal conversion device comprises a photodetector and a signal output interface connected with the photodetector. According to the invention, the filter made by a plasma photonic crystal has a good filtering effect within a forbidden band range; the tra |
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Bibliography: | Application Number: CN201711472734 |