Aluminum-scandium alloy target blank and preparation method and application thereof

• Main Authors: CHENG YINBING, ZHUANG MENG, ZHUANG ZHIJIE, GU ZONGHUI
• Format: Patent
• Language: Chinese; English
• Published: 27.03.2018
• Subjects: ALLOYS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; FERROUS OR NON-FERROUS ALLOYS; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TREATMENT OF ALLOYS OR NON-FERROUS METALS

The invention relates to an aluminum-scandium alloy target blank and a preparation method and application of the aluminum-scandium alloy target blank. The aluminum-scandium alloy target blank comprises, by weight, 16-50 parts of scandium and 50-84 parts of aluminum. The oxygen content of the aluminum-scandium alloy target blank is smaller than or equal to 160 ppm. The aluminum-scandium alloy target blank is high in scandium content and low in oxygen content, so that the prepared target blank cannot generate abnormal discharge or particle sputtering scars, and follow-up high-quality firm formation can be guaranteed. 本发明涉及种铝钪合金靶坯及其制备方法及应用。其中，铝钪合金靶坯包括：16-50重量份的钪，50-84重量份的铝，铝钪合金靶坯的含氧量小于等于160ppm。上述铝钪合金靶坯具有钪含量高、含氧量低，进而使得制备的靶坯不会发生异常放电或粒子溅疤，能够保证后期高品质成膜。