Mask
The invention relates to a mask. The mask comprises a dummy zone and at least one effective evaporation zone; the dummy zone is arranged outside the at least one effective evaporation zone; a plurality of first through holes are formed in the at least one effective evaporation zone; a plurality of s...
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Main Authors | , , , , , |
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Format | Patent |
Language | Chinese English |
Published |
20.03.2018
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Subjects | |
Online Access | Get full text |
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Summary: | The invention relates to a mask. The mask comprises a dummy zone and at least one effective evaporation zone; the dummy zone is arranged outside the at least one effective evaporation zone; a plurality of first through holes are formed in the at least one effective evaporation zone; a plurality of second through holes are formed in the dummy zone; the second through holes and the first through holes are identical in shape and equal in size; and the distance among the second through holes is equal to that among the first through holes. The second through holes are formed in the dummy zone outside the at least one effective evaporation zone, and the second through holes and the first through holes are identical in shape, size and distance, so that the dummy zone has the same mechanical properties as the at least one effective evaporation zone and has the same stress characteristic as the at least one effective evaporation zone, wrinkles are not produced easily between the dummy zone andthe at least one effectiv |
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Bibliography: | Application Number: CN201711006705 |