Etching solution composition and a method for producing a metal pattern using the composition

• Main Authors: DAESUNG LIM, HEESUNG YANG, JONGHYUN CHOUNG, MINJEONG KWON, YOUNGJIN YOON, YOUNGCHUL PARK, SANGTAE KIM, INSEOL KUK, HONGSICK PARK, JONGMUN LEE
• Format: Patent
• Language: Chinese; English
• Published: 02.02.2018
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE

The present invention relates to an etching solution composition and a method for producing a metal pattern using the composition. The etchant composition comprises: hydrogen peroxide; a fluorine-containing compound; an azole compound; a carboxyl-containing amine-based compound; a phosphoric acid-based compound; propylene glycol substituted or unsubstituted by a C-C alkyl group; or a C-Cane Butylated diols that are substituted or unsubstituted; and water. 本发明涉及种蚀刻液组合物及利用到该组合物的金属图案的制造方法。所述蚀刻液组合物包含：过氧化氢；含氟化合物；唑系化合物；含羧基胺系化合物；磷酸系化合物；被C-C烷基所取代或未被取代的丙二醇或者被C-C烷基所取代或未被取代的丁二醇；以及水。