Preparing method for self-cleaning antireflection film of solar collector

• Main Authors: LI HUI, CHEN WEIQIAN, XU SHIPENG, ZHANG HUI, LI YUHONG
• Format: Patent
• Language: Chinese; English
• Published: 19.01.2018
• Subjects: BLASTING; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; HEATING; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; LIGHTING; MECHANICAL ENGINEERING; METALLURGY; RANGES; SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; VENTILATING; WEAPONS

The invention relates to a preparing method for a self-cleaning antireflection film of a solar collector. The preparing method comprises the steps that a transparent flat glass or tempered glass is selected as a matrix, then the surface of the matrix is coated with a titanium dioxide file by adopting a magnetron sputtering film coating method under the conditions of the vacuum degree being 5*10<-4> Pa, the matrix negative bias pressure being 70V, the cavity body pressure being 0.8 Pa, and the volume ratio of argon to oxygen in gas being 2:1, the temperature of the matrix is kept at 90-95 DEG C, and a nitrogen-doped titanium matrix compound film layer is obtained after nitrogen is inlet and deposited; and finally the nitrogen-doped titanium matrix compound film layer is coated with the hydrophobic nano-silica film layer by adopting the magnetron sputtering film coating method under the condition of the vacuum degree being 5*10<-4> Pa, the matrix negative bias pressure being 100V, and process air being argon, t