Supporting slurry-injection method for surrounding rock between deep short-distance pump room chambers

The invention discloses a supporting slurry-injection method for surrounding rock between deep short-distance pump room chambers. The supporting slurry-injection method comprises the steps that a, twoparallel test drilled holes are formed in the surrounding rock between the deep short-distance pump...

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Bibliographic Details
Main Authors JIA CHUANYANG, FU HOULI, WANG HAILONG, JIANG JIANG, LIU KEMING, SONG XIAOYUAN, ZHANG GUIBIN, YU XIANBIN
Format Patent
LanguageChinese
English
Published 12.01.2018
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Summary:The invention discloses a supporting slurry-injection method for surrounding rock between deep short-distance pump room chambers. The supporting slurry-injection method comprises the steps that a, twoparallel test drilled holes are formed in the surrounding rock between the deep short-distance pump room chambers and penetrate through the surrounding rock between the short-distance pump room chambers; b, water is injected into the test drilled holes for removing chips, one sides of the test drilled holes are blocked through slurry injection plugs, and test probes of non-metal ultrasonic detectors stretch into the other sides of the test drilled holes; c, water is injected into the test drilled holes, the two test probes are moved simultaneously, and reading is conducted when the probes aremoved by every 20 cm till the probes are totally disengaged from the drilled holes; d, the broken range of the surrounding rock between the two test drilled holes is determined according to the readings; e, the forming positi
Bibliography:Application Number: CN20171563382