Laser device and extreme ultraviolet light generating device

• Main Authors: FUNAOKA KOUJI, NARUSE MASASHI
• Format: Patent
• Language: Chinese; English
• Published: 02.01.2018
• Subjects: BASIC ELECTRIC ELEMENTS; DEVICES USING STIMULATED EMISSION; ELECTRICITY

Provided are the following: a laser device in which an amplification device is mounted, via kinematic mounts, to a base frame; and an extreme ultraviolet (EUV) device using the laser device, wherein the device is configured to ensure that an optical axis does not change and that the laser quality does not degrade, even if thermal expansion and contraction occur in the structure of the kinematic mounts. The kinematic mounts (31-33) include three points (O, A, B) having zero degrees of freedom, one degree of freedom, and two degrees of freedom. When viewed from the direction perpendicular to a plane formed by said three points, extension lines (SU, CT) of the optical axis of a laser beam (18) that enters an amplification device (28) or leaves the amplification device are oriented toward point (O) having zero degrees of freedom. The translational direction of point (A) having one degree of freedom is oriented toward point (O) having zero degrees of freedom, and the extension line of the optical axis passes more