Stress detection device and method based on Mueller matrix

The embodiment of the invention relates to a stress detection device and method based on a Mueller matrix. The device comprises following optical devices: a light source, a polarizer, a first phase compensator, a to-be-detected optical material, a second phase compensator, a polarization analyzer an...

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Bibliographic Details
Main Authors GAO HAIJUN, DANG JIANGTAO, ZHONG FENGJIAO
Format Patent
LanguageChinese
English
Published 03.11.2017
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Summary:The embodiment of the invention relates to a stress detection device and method based on a Mueller matrix. The device comprises following optical devices: a light source, a polarizer, a first phase compensator, a to-be-detected optical material, a second phase compensator, a polarization analyzer and a photo-detector, which are arranged in the propagation direction of the light. The above optical devices are represented by the Mueller matrix, and based on an operation relation of the Mueller matrix of the light through the above optical devices, reversely solving Mueller matrix elements of the to-be-detected optical material. Parts of the Mueller matrix elements of the to-be-detected optical material in the Mueller matrix represent the stress of the to-be-detected optical material. According to the invention, stress of the material can be quantitatively measured; the accuracy, the sensitivity and the resolution are high; and the measurement is reliable and quick. 本公开的各实施例涉及种基于穆勒矩阵的应力检测装置及方法,该装置包括以下光学器件:依照光的传播
Bibliography:Application Number: CN20161268761