Atomic layer deposition apparatus
The invention relates to an apparatus (1) for atomic layer deposition comprising a frame (2), an injector head (40) provided with longitudinal slots for respectively supplying gasses to respective deposition spaces (41,42,43,44,45,46,47) confined by the longitudinal slots and a substrate (8), wherei...
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Main Authors | , , , |
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Format | Patent |
Language | Chinese English |
Published |
26.09.2017
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Subjects | |
Online Access | Get full text |
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Summary: | The invention relates to an apparatus (1) for atomic layer deposition comprising a frame (2), an injector head (40) provided with longitudinal slots for respectively supplying gasses to respective deposition spaces (41,42,43,44,45,46,47) confined by the longitudinal slots and a substrate (8), wherein the longitudinal slots are directed transverse to a movement in a first direction (X) of the substrate with respect to the injector head (40),a sub frame (52) arranged to suspend the injector head; a movable carrier (30) arranged to support the substrate (8) for the movement in the first direction (X);and gas pads (53,54,55)at the sub frame (52)outside the injector head (40)between the sub frame (52) and the moveable carrier (30)to bear the sub frame (52) on the carrier (30) for the movement in the first direction (X),wherein the apparatus further comprises actuators (60,61,62) for suspending the injector head (40) from the sub frame (52); and a control device (100) connected to the actuators (60,61,62) and arran |
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Bibliography: | Application Number: CN201680008200 |