Device and method for improving parallelism of injected ions

• Main Authors: KANG XIAOXU, ZENG SHAOHAI
• Format: Patent
• Language: Chinese; English
• Published: 19.09.2017
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY

The invention discloses a device and method for improving parallelism of injected ions, wherein the device comprises a target disc platform, a Faraday cup array, a micromagnetic field array and a control unit, the target disc is used for placing a to-be-processed wafer, the Faraday cup array is formed by Faraday cups on the same plane, the Faraday cup array and the to-be-processed wafer are on the same plane, the positions of the Faraday cup array and the to-be-processed wafer can be switched, the micromagnetic field array is arranged above the target disc platform towards an ion beam, and the control unit is separately connected with the micromagnetic field array and the Faraday cup array. According to the invention, the parallelism of the Faraday cup array detecting the ion beam is adopted, the parallelism of the ion beam is adjusted through the micromagnetic field array, incident ion spreading is avoided, and the parallelism of the injected ions is improved. 本发明公开了种提升注入离子平行性的装置及其方法，其中，所述装置包括靶盘平台、法拉第杯阵列、微磁场